JPS6211493B2 - - Google Patents
Info
- Publication number
- JPS6211493B2 JPS6211493B2 JP52026028A JP2602877A JPS6211493B2 JP S6211493 B2 JPS6211493 B2 JP S6211493B2 JP 52026028 A JP52026028 A JP 52026028A JP 2602877 A JP2602877 A JP 2602877A JP S6211493 B2 JPS6211493 B2 JP S6211493B2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- oxygen
- plasma
- resist
- pressure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2602877A JPS53112065A (en) | 1977-03-11 | 1977-03-11 | Removing method of high molecular compound |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2602877A JPS53112065A (en) | 1977-03-11 | 1977-03-11 | Removing method of high molecular compound |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS53112065A JPS53112065A (en) | 1978-09-30 |
JPS6211493B2 true JPS6211493B2 (en]) | 1987-03-12 |
Family
ID=12182239
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2602877A Granted JPS53112065A (en) | 1977-03-11 | 1977-03-11 | Removing method of high molecular compound |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS53112065A (en]) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0240280U (en]) * | 1988-09-13 | 1990-03-19 |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL8004007A (nl) * | 1980-07-11 | 1982-02-01 | Philips Nv | Werkwijze voor het vervaardigen van een halfgeleider- inrichting. |
NL8004008A (nl) * | 1980-07-11 | 1982-02-01 | Philips Nv | Werkwijze voor het vervaardigen van een halfgeleider- inrichting. |
JPS5924846A (ja) * | 1982-07-26 | 1984-02-08 | エスヴィージー・リトグラフィー・システムズ・インコーポレイテッド | ホトレジストの乾式現像法 |
JPH07118474B2 (ja) * | 1984-12-17 | 1995-12-18 | ソニー株式会社 | エツチングガス及びこれを用いたエツチング方法 |
JPS61214434A (ja) * | 1985-03-19 | 1986-09-24 | Tokyo Denshi Kagaku Kk | 有機膜の除去方法 |
JPS61267325A (ja) * | 1985-05-22 | 1986-11-26 | Tokyo Denshi Kagaku Kk | 有機膜の除去方法 |
JPS62125627A (ja) * | 1985-11-26 | 1987-06-06 | Tokyo Denshi Kagaku Kk | 有機膜の除去方法 |
JPH0773104B2 (ja) * | 1986-02-14 | 1995-08-02 | 富士通株式会社 | レジスト剥離方法 |
JPS62281331A (ja) * | 1986-05-29 | 1987-12-07 | Fujitsu Ltd | エツチング方法 |
JP2624243B2 (ja) * | 1986-09-19 | 1997-06-25 | 東京応化工業株式会社 | 有機膜の除去方法 |
JP2671435B2 (ja) * | 1988-09-29 | 1997-10-29 | 富士通株式会社 | 灰化方法 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51110276A (ja) * | 1975-03-25 | 1976-09-29 | Tokyo Shibaura Electric Co | Gasuetsuchingusochi |
-
1977
- 1977-03-11 JP JP2602877A patent/JPS53112065A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0240280U (en]) * | 1988-09-13 | 1990-03-19 |
Also Published As
Publication number | Publication date |
---|---|
JPS53112065A (en) | 1978-09-30 |
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